Large area, few-layer graphene films on arbitrary substrates by chemical vapor deposition

Publication Type:

Journal Article


Nano Lett., ACS Publications, Volume 9, Issue 1, p.30-35 (2009)




2009, 2013 and earlier


In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to
fabricate large area ( approximately cm2) films of single- to few-layer
graphene and to transfer the films to nonspecific substrates. These films
consist of regions of 1 to approximately 12 graphene layers. Single- or
bilayer regions can be up to 20 mum in lateral size. The films are
continuous over the entire area and can be patterned lithographically or
by prepatterning the underlying Ni film. The transparency, conductivity,
and ambipolar transfer characteristics of the films suggest their
potential as another materials candidate for electronics and
opto-electronic applications.


PMID: 19583185